A51N-07:
Water at Metal Oxide Interfaces: To Dissociate or Not to Dissociate?
Friday, 19 December 2014: 9:40 AM
John T Newberg1, Chris Arble1, Chris Goodwin1, Anibal Boscoboinik2, Xiao Tong2, Anna Ferrari3 and Livia Giordano4, (1)University of Delaware, Newark, DE, United States, (2)Brookhaven National Laboratory, Upton, NY, United States, (3)Universita di Torino, Torino, Italy, (4)Universita di Milano-Bicocca, Milano, Italy
Abstract:
Metal oxides are a major component of suspended aerosol particulate matter. The molecular level understanding of metal oxide surfaces has important implications in trace gas adsorption and/or chemical processing in atmospheric aerosol chemistry. The extent to which water molecularly adsorbs and/or dissociates at metal oxide interfaces under ambient conditions is becoming increasingly recognized through fundamental studies via spectroscopy and microscopy tools. We will be presenting recent efforts to understand the interfacial chemistry of metal oxide single crystal and thin film surfaces exposed to ambient water vapor conditions using in-vacuo X-ray Photoelectron Spectroscopy (XPS), ambient pressure XPS, scanning tunneling microscopy (STM), and computer simulations. Results highlight the importance of surface chemistry, metal oxide crystal termination, and external humidity conditions on the interfacial dynamics and chemistry of water at metal oxide interfaces.
